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DescriptionQ151
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Q151DesignAMDASIC interview problem

Order the Main Photolithography Steps

TechniquesDesignPhysical design
DifficultyEasy
TopicPhysical Design
LanguageSystemVerilog
Format4 choices
01

Problem

A wafer has a prepared film that must receive a patterned etch mask using a positive photoresist process. Which simplified process order and limitation are correct?

02

Answer choices (4)